Kinetics of reduction of a RuO2(110) film on Ru(0001) by atomic hydrogen

D Ugur, A Storm, R Verberk, JC Brouwer, WG Sloof

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	60-65
Number of pages	6
Journal	Microelectronic Engineering
Volume	110
DOIs	https://doi.org/10.1016/j.mee.2012.12.031
Publication status	Published - 2013

Keywords

@article{f5c96577b39f418ea2a119a4dd00a24e,

title = "Kinetics of reduction of a RuO2(110) film on Ru(0001) by atomic hydrogen",

keywords = "CWTS JFIS < 0.75",

author = "D Ugur and A Storm and R Verberk and JC Brouwer and WG Sloof",

year = "2013",

doi = "10.1016/j.mee.2012.12.031",

language = "English",

volume = "110",

pages = "60--65",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Kinetics of reduction of a RuO2(110) film on Ru(0001) by atomic hydrogen

AU - Ugur, D

AU - Storm, A

AU - Verberk, R

AU - Brouwer, JC

AU - Sloof, WG

PY - 2013

Y1 - 2013

KW - CWTS JFIS < 0.75

U2 - 10.1016/j.mee.2012.12.031

DO - 10.1016/j.mee.2012.12.031

M3 - Article

SN - 0167-9317

VL - 110

SP - 60

EP - 65

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -