Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100C

M He, R Ishihara, EJJ Neihof, Y van Andel, H Schellevis, JW Metselaar, CIM Beenakker

Research output: Contribution to journalArticleScientificpeer-review

15 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)1245-1249
Number of pages5
JournalJapanese Journal of Applied Physics. Part 2, Letters & Express Lettres
Volume46
Issue number3B
Publication statusPublished - 2007

Keywords

  • Elektrotechniek
  • Techniek
  • academic journal papers
  • CWTS JFIS < 0.75

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