Laser annealing for ultra-shallow junction formation in advanced CMOS

R Surdeanu, YV Ponomarev, R Cerutti, BJ Pawlak, LK Nanver, I Hoflijk, PA Stolk, CJJ Dachs, MA Verheijen, M Kaiser, MJP Hopstaken, JGM van Berkum, F Roozeboom, R Lindsay

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationElectrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III
Place of Publications.l.
Publishers.n.
Pages1-12
Number of pages12
Publication statusPublished - 2002
EventElectrochemical Society 201st meeting, Philadelphia, USA - s.l.
Duration: 12 May 200217 May 2002

Publication series

Name
Publishers.n.

Conference

ConferenceElectrochemical Society 201st meeting, Philadelphia, USA
Period12/05/0217/05/02

Keywords

  • Conf.proc. > 3 pag

Cite this

Surdeanu, R., Ponomarev, YV., Cerutti, R., Pawlak, BJ., Nanver, LK., Hoflijk, I., Stolk, PA., Dachs, CJJ., Verheijen, MA., Kaiser, M., Hopstaken, MJP., van Berkum, JGM., Roozeboom, F., & Lindsay, R. (2002). Laser annealing for ultra-shallow junction formation in advanced CMOS. In Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III (pp. 1-12). s.n..