Laser annealing for ultra-shallow junction formation in advanced CMOS

R Surdeanu; YV Ponomarev; R Cerutti; BJ Pawlak; LK Nanver; I Hoflijk; PA Stolk; CJJ Dachs; MA Verheijen; M Kaiser; MJP Hopstaken; JGM van Berkum; F Roozeboom; R Lindsay

Laser annealing for ultra-shallow junction formation in advanced CMOS

R Surdeanu, YV Ponomarev, R Cerutti, BJ Pawlak, LK Nanver, I Hoflijk, PA Stolk, CJJ Dachs, MA Verheijen, M Kaiser, MJP Hopstaken, JGM van Berkum, F Roozeboom, R Lindsay

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III
Place of Publication	s.l.
Publisher	s.n.
Pages	1-12
Number of pages	12
Publication status	Published - 2002
Event	Electrochemical Society 201st meeting, Philadelphia, USA - s.l. Duration: 12 May 2002 → 17 May 2002

Publication series

Name
Publisher	s.n.

Conference

Conference	Electrochemical Society 201st meeting, Philadelphia, USA
Period	12/05/02 → 17/05/02

Keywords

Conf.proc. > 3 pag

Cite this

Surdeanu, R., Ponomarev, YV., Cerutti, R., Pawlak, BJ., Nanver, LK., Hoflijk, I., Stolk, PA., Dachs, CJJ., Verheijen, MA., Kaiser, M., Hopstaken, MJP., van Berkum, JGM., Roozeboom, F., & Lindsay, R. (2002). Laser annealing for ultra-shallow junction formation in advanced CMOS. In Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III (pp. 1-12). s.n..

@inproceedings{2652db66c2a140cea2476e1550732bca,

title = "Laser annealing for ultra-shallow junction formation in advanced CMOS",

keywords = "Conf.proc. > 3 pag",

author = "R Surdeanu and YV Ponomarev and R Cerutti and BJ Pawlak and LK Nanver and I Hoflijk and PA Stolk and CJJ Dachs and MA Verheijen and M Kaiser and MJP Hopstaken and {van Berkum}, JGM and F Roozeboom and R Lindsay",

year = "2002",

language = "Undefined/Unknown",

publisher = "s.n.",

pages = "1--12",

booktitle = "Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III",

note = "Electrochemical Society 201st meeting, Philadelphia, USA ; Conference date: 12-05-2002 Through 17-05-2002",

}

Surdeanu, R, Ponomarev, YV, Cerutti, R, Pawlak, BJ, Nanver, LK, Hoflijk, I, Stolk, PA, Dachs, CJJ, Verheijen, MA, Kaiser, M, Hopstaken, MJP, van Berkum, JGM, Roozeboom, F & Lindsay, R 2002, Laser annealing for ultra-shallow junction formation in advanced CMOS. in Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III. s.n., s.l., pp. 1-12, Electrochemical Society 201st meeting, Philadelphia, USA, 12/05/02.

Laser annealing for ultra-shallow junction formation in advanced CMOS. / Surdeanu, R; Ponomarev, YV; Cerutti, R et al.
Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III. s.l.: s.n., 2002. p. 1-12.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Laser annealing for ultra-shallow junction formation in advanced CMOS

AU - Surdeanu, R

AU - Ponomarev, YV

AU - Cerutti, R

AU - Pawlak, BJ

AU - Nanver, LK

AU - Hoflijk, I

AU - Stolk, PA

AU - Dachs, CJJ

AU - Verheijen, MA

AU - Kaiser, M

AU - Hopstaken, MJP

AU - van Berkum, JGM

AU - Roozeboom, F

AU - Lindsay, R

PY - 2002

Y1 - 2002

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SP - 1

EP - 12

BT - Electrochemical Society 201st Meeting - Symposium Q1 - Rapid thermal and other short-time processing technologies III

PB - s.n.

CY - s.l.

T2 - Electrochemical Society 201st meeting, Philadelphia, USA

Y2 - 12 May 2002 through 17 May 2002

ER -