Laser Annealing of Self-Aligned As+ Implants in Contact Windows for Ultrashallow Junction Formation

C Biasotto, V Gonda, LK Nanver, J van der Cingel, V Jovanovic

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProc. of 24th Symposium on Microelectronics Technology and Devices Dielectric and Semiconductor Materials, Devices, and Processing (SBMicro 2009)
EditorsDW de Lima Monteiro, O Bonnaud, N Morimoto
Place of PublicationNatal, Brazil
PublisherElectrochemical Society
Pages19-27
Number of pages9
ISBN (Print)978-1-5677-737-7
Publication statusPublished - 2009
Event24th Symposium on Microelectronics Technology and Devices Dielectric and Semiconductor Materials, Devices, and Processing (SBMicro 2009) - Natal, Brazil
Duration: 31 Aug 20093 Sep 2009

Publication series

Name
PublisherElectrochemical Society

Conference

Conference24th Symposium on Microelectronics Technology and Devices Dielectric and Semiconductor Materials, Devices, and Processing (SBMicro 2009)
Period31/08/093/09/09

Keywords

  • Conf.proc. > 3 pag

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