Laser CVD of silicon nanoclusters and in-situ process characterization

APLM Goossens; W Besling; J Schoonman

Laser CVD of silicon nanoclusters and in-situ process characterization

APLM Goossens, W Besling, J Schoonman

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of the Twelfth European Conference on Chemical Vapour Deposition (EuroCVD-12)
Editors	A Figueras
Publisher	EDP France
Pages	519-528
Number of pages	10
Publication status	Published - 1999

Publication series

Name
Publisher	EDP France

Name	The European Physical Journal. Special Topics
Volume	9
ISSN (Print)	1155-4339

Bibliographical note

ISSN: 1155-4339

Cite this

@inproceedings{e6ab74fe98b4432ca8993c3c906d6c2f,

title = "Laser CVD of silicon nanoclusters and in-situ process characterization",

author = "APLM Goossens and W Besling and J Schoonman",

note = "ISSN: 1155-4339",

year = "1999",

language = "Undefined/Unknown",

publisher = "EDP France",

pages = "519--528",

editor = "A Figueras",

booktitle = "Proceedings of the Twelfth European Conference on Chemical Vapour Deposition (EuroCVD-12)",

}

Laser CVD of silicon nanoclusters and in-situ process characterization. / Goossens, APLM; Besling, W; Schoonman, J.
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition (EuroCVD-12). ed. / A Figueras. EDP France, 1999. p. 519-528 (The European Physical Journal. Special Topics; Vol. 9).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific