Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining.

MA Blauw, G Craciun, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of the National Dutch Sensor Symposium.
EditorsM Elwenspoek
Pages89-94
Number of pages6
Publication statusPublished - 2001

Keywords

  • ZX Int.klas.verslagjaar < 2002

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