Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining

MA Blauw, G Cracium, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings
Place of Publication	Dordrecht
Publisher	Kluwer
Pages	89-94
Number of pages	6
ISBN (Print)	0-7923-7012-0
Publication status	Published - 2001
Event	Sensor Technology Conference 2001, Enschede - Dordrecht Duration: 14 May 2001 → 15 May 2001

Name
Publisher	Kluwer

Conference	Sensor Technology Conference 2001, Enschede
Period	14/05/01 → 15/05/01

Keywords

@inproceedings{b08c4c02f3f545d8bdcf5500025f11d0,

title = "Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "MA Blauw and G Cracium and PJ French",

year = "2001",

language = "Undefined/Unknown",

isbn = "0-7923-7012-0",

publisher = "Kluwer",

pages = "89--94",

booktitle = "Proceedings",

note = "Sensor Technology Conference 2001, Enschede ; Conference date: 14-05-2001 Through 15-05-2001",

}

TY - GEN

T1 - Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining

AU - Blauw, MA

AU - Cracium, G

AU - French, PJ

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 0-7923-7012-0

SP - 89

EP - 94

BT - Proceedings

PB - Kluwer

CY - Dordrecht

T2 - Sensor Technology Conference 2001, Enschede

Y2 - 14 May 2001 through 15 May 2001

ER -