Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining

MA Blauw, G Cracium, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings
Place of PublicationDordrecht
PublisherKluwer
Pages89-94
Number of pages6
ISBN (Print)0-7923-7012-0
Publication statusPublished - 2001
EventSensor Technology Conference 2001, Enschede - Dordrecht
Duration: 14 May 200115 May 2001

Publication series

Name
PublisherKluwer

Conference

ConferenceSensor Technology Conference 2001, Enschede
Period14/05/0115/05/01

Keywords

  • ZX Int.klas.verslagjaar < 2002

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