@article{891c6b6d5aef49318d7ca8da92c12e2c,
title = "Limiting Factors for electron beam lithography when using ultra-thin HSQ layers",
keywords = "academic journal papers, Vakpubl., Overig wet. > 3 pag",
author = "AE Grigorescu and {van der Krogt}, MC and CW Hagen",
note = "IssN nr 1537-1646, Vervangt Journal of Microlithography, Microfabrication en Microsystems, wordt gewaardeerd op 0,57, maar dat kan ik niet kwijt",
year = "2007",
language = "Undefined/Unknown",
volume = "6",
pages = "3006--3012",
journal = "Journal of Micro/Nanolithography, MEMS, and MOEMS",
issn = "1932-5150",
publisher = "SPIE",
number = "4",
}