Limiting Factors for electron beam lithography when using ultra-thin HSQ layers

AE Grigorescu, MC van der Krogt, CW Hagen

Research output: Contribution to journalArticleScientificpeer-review

Original languageUndefined/Unknown
Pages (from-to)3006-3012
Number of pages7
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Issue number4
Publication statusPublished - 2007


  • academic journal papers
  • Vakpubl., Overig wet. > 3 pag

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