Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask.

M Singh (Inventor), JJM Braat (Inventor)

Research output: Patent

Original languageUndefined/Unknown
Patent numberUS 6,985,211
IPCaanvrager: ASML Netherlands B.V.
Priority date10/01/06
Publication statusPublished - 2006

Bibliographical note

aanvrager: ASML Netherlands B.V.


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