Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask.

M Singh; JJM Braat

Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask.

M Singh (Inventor), JJM Braat (Inventor)

ImPhys/Optics

Research output: Patent

Original language	Undefined/Unknown
Patent number	US 6,985,211
IPC	aanvrager: ASML Netherlands B.V.
Priority date	10/01/06
Publication status	Published - 2006

Bibliographical note

aanvrager: ASML Netherlands B.V.

Keywords

Octrooi

Cite this

@misc{4ee5498cb97e43c899ceda8e9c288b3d,

title = "Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask.",

keywords = "Octrooi",

author = "M Singh and JJM Braat",

note = "aanvrager: ASML Netherlands B.V.; US 6,985,211; aanvrager: ASML Netherlands B.V.",

year = "2006",

language = "Undefined/Unknown",

type = "Patent",

}