Lithography system

M Wieland (Inventor), J van Spijker (Inventor), R. Jager (Inventor), P Kruit (Inventor)

    Research output: Patent

    Original languageUndefined/Unknown
    IPCH04N, A61N, H01L, G02B, G03F, H01J, G03B, G01J, G21K
    Priority date25/10/02
    Publication statusPublished - 2004

    Bibliographical note

    Patent: ?
    Applicant: Mapper Lithography IP B.V., Delft, The Netherlands

    Keywords

    • Octrooi

    • Lithography system

      Wieland, M., van Spijker, J., Jager, R. & Kruit, P., 2005, IPC No. verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands, Patent No. US 6,958,804, Priority date 25 Oct 2005

      Research output: Patent

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