Lithography system and projection method

P Kruit (Inventor), MJJ Wieland (Inventor), S. Steenbrink (Inventor), R Jager (Inventor)

Research output: Patent

Original languageUndefined/Unknown
Patent numberUS7842936 B2
IPCVerleend. Aanvrager: Mapper Lithography
Priority date30/11/10
Publication statusPublished - 2010

Keywords

  • Octrooi
  • Verleend

Cite this

Kruit, P., Wieland, MJJ., Steenbrink, S., & Jager, R. (2010). IPC No. Verleend. Aanvrager: Mapper Lithography. Lithography system and projection method. (Patent No. US7842936 B2).