Lithography system, method of heat dissipation and frame

P Kruit (Inventor), MP Dansberg (Inventor), MJJ Wieland (Inventor)

    Research output: Patent

    Original languageEnglish
    Patent numberWO 2008013443 A2
    IPCApplicant: Mapper Lithography IP BV
    Priority date31/01/08
    Publication statusPublished - 2008

    Keywords

    • Geen VSNU-classificatie

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