| Original language | English |
|---|---|
| Patent number | US 8325321 B2 |
| IPC | Applicant: Mapper Lithography IP BV |
| Priority date | 4/12/12 |
| Publication status | Published - 2012 |
Lithography system, method of heat dissipation and frame
P Kruit (Inventor), MP Dansberg (Inventor), MJJ Wieland (Inventor)
Research output: Patent