Lithography system, sensor and measuring method

P Kruit (Inventor), E Slot (Inventor), TF Teepen (Inventor), MJJ Wieland (Inventor), SWHK Steenbrink (Inventor)

Research output: Patent

Original language	Undefined/Unknown
Patent number	US7868300B2
IPC	Aanvrager: MAPPER Lithography B.V.
Priority date	11/01/11
Publication status	Published - 2011

Aanvrager: MAPPER Lithography B.V.

Keywords

@misc{1f5a0fc78d474a58a7210507475f5f78,

title = "Lithography system, sensor and measuring method",

keywords = "Octrooi",

author = "P Kruit and E Slot and TF Teepen and MJJ Wieland and SWHK Steenbrink",

note = "Aanvrager: MAPPER Lithography B.V.; US7868300B2; Aanvrager: MAPPER Lithography B.V.",

year = "2011",

language = "Undefined/Unknown",

type = "Patent",

}