Lithography system

M Wieland; J van Spijker; R. Jager; P Kruit

Lithography system

M Wieland (Inventor), J van Spijker (Inventor), R. Jager (Inventor), P Kruit (Inventor)

Research output: Patent

Original language	Undefined/Unknown
Patent number	US 6,958,804
IPC	verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands
Priority date	25/10/05
Publication status	Published - 2005

Bibliographical note

verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands

Keywords

Octrooi

Lithography system
Wieland, M., van Spijker, J., Jager, R. & Kruit, P., 2004, IPC No. H04N, A61N, H01L, G02B, G03F, H01J, G03B, G01J, G21K, Priority date 25 Oct 2002, Priority No. WO 2004038509 A2
Research output: Patent

Cite this

@misc{f98518066af14743b95de0cef368c564,

title = "Lithography system",

keywords = "Octrooi",

author = "M Wieland and {van Spijker}, J and R. Jager and P Kruit",

note = "verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands; US 6,958,804; verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands",

year = "2005",

language = "Undefined/Unknown",

type = "Patent",

}