Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals

HHJE Kicken; PFA Alkemade; RW van der Heijden; F Karouta; R Notzel; EWJM van der Drift; HWM Salemink

doi:DOI: 101109/iciprm

Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals

HHJE Kicken, PFA Alkemade, RW van der Heijden, F Karouta, R Notzel, EWJM van der Drift, HWM Salemink

QN/Kavli Nanolab Delft

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals
Editors	s.n.
Place of Publication	New York
Publisher	IEEE Society
Pages	31-34
Number of pages	4
ISBN (Print)	978-1-4244-3432-9
DOIs	https://doi.org/DOI: 101109/iciprm
Publication status	Published - 2009
Event	IEEE International Conference on Indium Phosphide & Related Materials, 2009 - New York Duration: 10 May 2009 → 14 May 2009

Publication series

Name
Publisher	IEEE

Conference

Conference	IEEE International Conference on Indium Phosphide & Related Materials, 2009
Period	10/05/09 → 14/05/09

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Access to Document

DOI: 101109/iciprm

Cite this

Kicken, HHJE., Alkemade, PFA., van der Heijden, RW., Karouta, F., Notzel, R., van der Drift, EWJM., & Salemink, HWM. (2009). Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. In s.n. (Ed.), Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals (pp. 31-34). IEEE Society. https://doi.org/DOI: 101109/iciprm

@inproceedings{e73d2a79dcf043ad8f1107c444283d62,

title = "Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "HHJE Kicken and PFA Alkemade and {van der Heijden}, RW and F Karouta and R Notzel and {van der Drift}, EWJM and HWM Salemink",

year = "2009",

doi = "DOI: 101109/iciprm",

language = "Undefined/Unknown",

isbn = "978-1-4244-3432-9",

publisher = "IEEE Society",

pages = "31--34",

editor = "s.n.",

booktitle = "Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals",

note = "IEEE International Conference on Indium Phosphide & Related Materials, 2009 ; Conference date: 10-05-2009 Through 14-05-2009",

}

Kicken, HHJE, Alkemade, PFA, van der Heijden, RW, Karouta, F, Notzel, R, van der Drift, EWJM & Salemink, HWM 2009, Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. in s.n. (ed.), Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. IEEE Society, New York, pp. 31-34, IEEE International Conference on Indium Phosphide & Related Materials, 2009, 10/05/09. https://doi.org/DOI: 101109/iciprm

Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. / Kicken, HHJE; Alkemade, PFA; van der Heijden, RW et al.
Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. ed. / s.n. New York: IEEE Society, 2009. p. 31-34.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals

AU - Kicken, HHJE

AU - Alkemade, PFA

AU - van der Heijden, RW

AU - Karouta, F

AU - Notzel, R

AU - van der Drift, EWJM

AU - Salemink, HWM

PY - 2009

Y1 - 2009

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

U2 - DOI: 101109/iciprm

DO - DOI: 101109/iciprm

M3 - Conference contribution

SN - 978-1-4244-3432-9

SP - 31

EP - 34

BT - Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals

A2 - s.n., null

PB - IEEE Society

CY - New York

T2 - IEEE International Conference on Indium Phosphide & Related Materials, 2009

Y2 - 10 May 2009 through 14 May 2009

ER -

Kicken HHJE, Alkemade PFA, van der Heijden RW, Karouta F, Notzel R, van der Drift EWJM et al. Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. In s.n., editor, Local digital etching and infiltration for tuning of a H1-cavity in deeply etched InP/InGaAsP/InP photonic crystals. New York: IEEE Society. 2009. p. 31-34 doi: DOI: 101109/iciprm