Location control of large Si grains by dual beam excimer-laser and thick oxide portion.

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	3872-3878
Number of pages	7
Journal	Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres
Volume	39
Issue number	7A
Publication status	Published - 2000

Keywords

@article{1bf8390a0e8349a288b7adb61d98fac0,

title = "Location control of large Si grains by dual beam excimer-laser and thick oxide portion.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "R Ishihara and A Burstev and PFA Alkemade",

year = "2000",

language = "Undefined/Unknown",

volume = "39",

pages = "3872--3878",

journal = "Japanese Journal of Applied Physics. Part 2, Letters \& Express Lettres",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "7A",

}

TY - JOUR

T1 - Location control of large Si grains by dual beam excimer-laser and thick oxide portion.

AU - Ishihara, R

AU - Burstev, A

AU - Alkemade, PFA

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 0021-4922

VL - 39

SP - 3872

EP - 3878

JO - Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres

JF - Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres

IS - 7A

ER -