Location-control of large Si grains by dual-beam excimer-laser and thick oxide portion

R Ishihara, A Burtsev, PFA Alkemade

Research output: Contribution to journal › Article › Scientific

Original language	Undefined/Unknown
Pages (from-to)	3872-3878
Number of pages	7
Journal	Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres
Volume	39
Issue number	7
Publication status	Published - 2000

Keywords

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title = "Location-control of large Si grains by dual-beam excimer-laser and thick oxide portion",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "R Ishihara and A Burtsev and PFA Alkemade",

year = "2000",

language = "Undefined/Unknown",

volume = "39",

pages = "3872--3878",

journal = "Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "7",

}

TY - JOUR

T1 - Location-control of large Si grains by dual-beam excimer-laser and thick oxide portion

AU - Ishihara, R

AU - Burtsev, A

AU - Alkemade, PFA

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 0021-4922

VL - 39

SP - 3872

EP - 3878

JO - Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres

JF - Japanese Journal of Applied Physics. Part 2, Letters & Express Lettres

IS - 7

ER -