Low-complexity full-melt laser-anneal process for fabrication of low-leakage implanted ultrashallow junctions

C Biasotto; V Gonda; LK Nanver; TLM Scholtes; J van der Cingel; D Vidal; V Jovanovic

doi:10.1007/s11664-011-1734-6

Low-complexity full-melt laser-anneal process for fabrication of low-leakage implanted ultrashallow junctions

C Biasotto, V Gonda, LK Nanver, TLM Scholtes, J van der Cingel, D Vidal, V Jovanovic

Electronic Components, Technology and Materials

Research output: Contribution to journal › Article › Scientific › peer-review

1 Citation (Scopus)

Original language	English
Pages (from-to)	2187-2196
Number of pages	10
Journal	Journal of Electronic Materials
Volume	40
Issue number	11
DOIs	https://doi.org/10.1007/s11664-011-1734-6
Publication status	Published - 2011

Keywords

academic journal papers
CWTS JFIS < 0.75

Access to Document

10.1007/s11664-011-1734-6

Cite this

@article{ad16f9c1f9a0466bb29ca655e44b9d43,

title = "Low-complexity full-melt laser-anneal process for fabrication of low-leakage implanted ultrashallow junctions",

keywords = "academic journal papers, CWTS JFIS < 0.75",

author = "C Biasotto and V Gonda and LK Nanver and TLM Scholtes and {van der Cingel}, J and D Vidal and V Jovanovic",

year = "2011",

doi = "10.1007/s11664-011-1734-6",

language = "English",

volume = "40",

pages = "2187--2196",

journal = "Journal of Electronic Materials",

issn = "0361-5235",

publisher = "Springer",

number = "11",

}

TY - JOUR

T1 - Low-complexity full-melt laser-anneal process for fabrication of low-leakage implanted ultrashallow junctions

AU - Biasotto, C

AU - Gonda, V

AU - Nanver, LK

AU - Scholtes, TLM

AU - van der Cingel, J

AU - Vidal, D

AU - Jovanovic, V

PY - 2011

Y1 - 2011

KW - academic journal papers

KW - CWTS JFIS < 0.75

U2 - 10.1007/s11664-011-1734-6

DO - 10.1007/s11664-011-1734-6

M3 - Article

SN - 0361-5235

VL - 40

SP - 2187

EP - 2196

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 11

ER -