Low-Loss, Compact, and Polarization Independent PHASAR Demultiplexer Fabricated by Using a Double-Etch Process

JH den Besten, MP Dessens, XJM Leijtens, CGP Herben, FH Groen, MR Leys, MK Smit

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	62-64
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	14
Issue number	1
Publication status	Published - 2002

Keywords

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title = "Low-Loss, Compact, and Polarization Independent PHASAR Demultiplexer Fabricated by Using a Double-Etch Process",

keywords = "ZX CWTS 1.00 <= JFIS < 3.00",

author = "{den Besten}, JH and MP Dessens and XJM Leijtens and CGP Herben and FH Groen and MR Leys and MK Smit",

year = "2002",

language = "Undefined/Unknown",

volume = "14",

pages = "62--64",

journal = "IEEE Photonics Technology Letters",

issn = "1041-1135",

publisher = "Institute of Electrical and Electronics Engineers (IEEE)",

number = "1",

}

TY - JOUR

T1 - Low-Loss, Compact, and Polarization Independent PHASAR Demultiplexer Fabricated by Using a Double-Etch Process

AU - den Besten, JH

AU - Dessens, MP

AU - Leijtens, XJM

AU - Herben, CGP

AU - Groen, FH

AU - Leys, MR

AU - Smit, MK

PY - 2002

Y1 - 2002

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 1041-1135

VL - 14

SP - 62

EP - 64

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 1

ER -