Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts

H.V. Bui, Fabio Grillo, Sri Sharath Kulkarni, Ronald Bevaart, V.T. Nguyên, Bart Van Der Linden, Jacob A. Moulijn, Michiel Makkee, Michiel T. Kreutzer, J. Ruud Van Ommen

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)
40 Downloads (Pure)


We tailored the size distribution of Pt nanoparticles (NPs) on graphene nanoplatelets at a given metal loading by using low-temperature atomic layer deposition carried out in a fluidized bed reactor operated at atmospheric pressure. The Pt NPs deposited at low temperature (100 °C) after 10 cycles were more active and stable towards the propene oxidation reaction than their high-temperature counterparts. Crucially, the gap in the catalytic performance was retained even after prolonged periods of time (>24 hours) at reaction temperatures as high as 450 °C. After exposure to such harsh conditions the Pt NPs deposited at 100 °C still retained a size distribution that is narrower than the one of the as-synthesized NPs obtained at 250 °C. The difference in performance correlated with the difference in the number of facet sites as estimated after the catalytic test. Our approach provides not only a viable route for the scalable synthesis of stable supported Pt NPs with tailored size distributions but also a tool for studying the structure-function relationship.

Original languageEnglish
Pages (from-to)10802-10810
Number of pages9
Issue number30
Publication statusPublished - 14 Aug 2017


Dive into the research topics of 'Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts'. Together they form a unique fingerprint.

Cite this