Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts

H.V. Bui, Fabio Grillo*, Sri Sharath Kulkarni, Ronald Bevaart, V.T. Nguyên, Bart Van Der Linden, Jacob A. Moulijn, Michiel Makkee, Michiel T. Kreutzer, J. Ruud Van Ommen

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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Material Science

Chemical Engineering