Low temperature gateoxide process for n-channel SiGe Modulation Doped Field Effect Transistors

B Bozon, T Zijlstra, M Glueck, J Hersener, EWJM van der Drift, U König

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)4611-4615
Number of pages5
JournalJournal of Applied Physics
Volume82
Publication statusPublished - 1997

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