TY - JOUR
T1 - Lutetium coating of nanoparticles by atomic layer deposition
AU - Moret, Josette L.T.M.
AU - Griffiths, Matthew B.E.
AU - Frijns, Jeannine E.B.M.
AU - Terpstra, Baukje E.
AU - Wolterbeek, Hubert T.
AU - Barry, Seán T.
AU - Denkova, Antonia G.
AU - Van Ommen, J. Ruud
N1 - Accepted Author Manuscript
PY - 2020
Y1 - 2020
N2 - Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.
AB - Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.
UR - http://www.scopus.com/inward/record.url?scp=85079590250&partnerID=8YFLogxK
U2 - 10.1116/1.5134446
DO - 10.1116/1.5134446
M3 - Article
AN - SCOPUS:85079590250
VL - 38
JO - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
JF - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
SN - 0734-2101
IS - 2
M1 - 022414
ER -