Lutetium coating of nanoparticles by atomic layer deposition

Josette L.T.M. Moret, Matthew B.E. Griffiths, Jeannine E.B.M. Frijns, Baukje E. Terpstra, Hubert T. Wolterbeek, Seán T. Barry, Antonia G. Denkova, J. Ruud Van Ommen

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Abstract

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

Original languageEnglish
Article number022414
Number of pages8
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume38
Issue number2
DOIs
Publication statusPublished - 2020

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