Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s

EAG Hamers; AHM Smets; C Smit; JPM Hoefnagels; WMM Kessels; MCM van de Sanden

Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s

EAG Hamers, AHM Smets, C Smit, JPM Hoefnagels, WMM Kessels, MCM van de Sanden

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

9 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings
Editors	M Stutzmann, et al.
Place of Publication	Warrendale, PENN. USA
Publisher	Materials Research Society
Pages	1-6
Number of pages	6
ISBN (Print)	1-55899-600-1
Publication status	Published - 2001
Event	Materials Research Society Symposium Proceedings 2001 - San Francisco, United States Duration: 16 Apr 2002 → 20 Apr 2002

Publication series

Name
Publisher	Materials Research Society

Name
Volume	664

Conference

Conference	Materials Research Society Symposium Proceedings 2001
Country/Territory	United States
City	San Francisco
Period	16/04/02 → 20/04/02

Bibliographical note

niet eerder opgevoerd

Keywords

Elektrotechniek
Techniek
Conf.proc. > 3 pag

Cite this

Hamers, EAG., Smets, AHM., Smit, C., Hoefnagels, JPM., Kessels, WMM., & van de Sanden, MCM. (2001). Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s. In M. Stutzmann, & et al. (Eds.), Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings (pp. 1-6). Materials Research Society.

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title = "Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s",

keywords = "Elektrotechniek, Techniek, Conf.proc. > 3 pag",

author = "EAG Hamers and AHM Smets and C Smit and JPM Hoefnagels and WMM Kessels and {van de Sanden}, MCM",

note = "niet eerder opgevoerd; Materials Research Society Symposium Proceedings 2001 ; Conference date: 16-04-2002 Through 20-04-2002",

year = "2001",

language = "Undefined/Unknown",

isbn = "1-55899-600-1",

publisher = "Materials Research Society",

pages = "1--6",

editor = "M Stutzmann and {et al.}",

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Hamers, EAG, Smets, AHM, Smit, C, Hoefnagels, JPM, Kessels, WMM & van de Sanden, MCM 2001, Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s. in M Stutzmann & et al. (eds), Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings. Materials Research Society, Warrendale, PENN. USA, pp. 1-6, Materials Research Society Symposium Proceedings 2001, San Francisco, United States, 16/04/02.

Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s. / Hamers, EAG; Smets, AHM; Smit, C et al.
Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings. ed. / M Stutzmann; et al. Warrendale, PENN. USA: Materials Research Society, 2001. p. 1-6.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s

AU - Hamers, EAG

AU - Smets, AHM

AU - Smit, C

AU - Hoefnagels, JPM

AU - Kessels, WMM

AU - van de Sanden, MCM

N1 - niet eerder opgevoerd

PY - 2001

Y1 - 2001

KW - Elektrotechniek

KW - Techniek

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 1-55899-600-1

SP - 1

EP - 6

BT - Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings

A2 - Stutzmann, M

A2 - et al., null

PB - Materials Research Society

CY - Warrendale, PENN. USA

T2 - Materials Research Society Symposium Proceedings 2001

Y2 - 16 April 2002 through 20 April 2002

ER -

Hamers EAG, Smets AHM, Smit C, Hoefnagels JPM, Kessels WMM, van de Sanden MCM. Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s. In Stutzmann M, et al., editors, Amorphous and Heterogeneous Silicon-Based Films-2001; Materials Research Society Symposium Proceedings. Warrendale, PENN. USA: Materials Research Society. 2001. p. 1-6