Mechanical Reliability of CVD-Copper Thin Films

JF Jongste, JP Lokker, GCAM Janssen, S Radelaar, J Torres, J Palleau

    Research output: Contribution to journalArticleScientificpeer-review

    6 Citations (Scopus)
    Original languageUndefined/Unknown
    JournalMicroelectronic Engineering
    Volume33
    Publication statusPublished - 1997

    Cite this

    Jongste, JF., Lokker, JP., Janssen, GCAM., Radelaar, S., Torres, J., & Palleau, J. (1997). Mechanical Reliability of CVD-Copper Thin Films. Microelectronic Engineering, 33.