Mechanical Reliability of CVD-Copper Thin Films

JF Jongste, JP Lokker, GCAM Janssen, S Radelaar, J Torres, J Palleau

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Journal	Microelectronic Engineering
Volume	33
Publication status	Published - 1997

Cite this

@article{246b17f1303447d1bfe680fde3b4cea2,

title = "Mechanical Reliability of CVD-Copper Thin Films",

author = "JF Jongste and JP Lokker and GCAM Janssen and S Radelaar and J Torres and J Palleau",

year = "1997",

language = "Undefined/Unknown",

volume = "33",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}