Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing

Research output: Contribution to journalArticleScientificpeer-review

33 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2873-2879
Number of pages7
JournalJournal of Applied Physics
Volume95
Issue number5
Publication statusPublished - 2004

Keywords

  • academic journal papers
  • ZX CWTS 1.00 <= JFIS < 3.00

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