| Original language | English |
|---|---|
| IPC | G06N, H01L |
| Priority date | 30/06/22 |
| Publication status | Published - 2015 |
| Externally published | Yes |
Bibliographical note
Patent:-Applicant: Microsoft
Applicant: Microsoft
Method for selectively etching a metal component
Di Xu (Inventor)
Research output: Patent
Applicant: Microsoft