| Original language | English |
|---|---|
| Patent number | EP 4268290 B1 |
| IPC | G06N, H01L, H10N |
| Priority date | 30/06/22 |
| Publication status | Published - 2015 |
Bibliographical note
Patent:-Applicant: Microsoft
Research output
- 1 Patent
-
Method for selectively etching a metal component
Xu, D., 2015, IPC No. G06N, H01L, Priority date 30 Jun 2022, Priority No. WO 2022135726 A1Research output: Patent
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