TY - JOUR
T1 - Microcolumn with variable axis lens for large scan fields and pixel numbers
AU - Weigand, H.
AU - Gautsch, S.
AU - Strohmaier, W.
AU - Blideran, M
AU - Staufer, U
AU - de Rooij, NF
AU - Kern, DP
PY - 2011
Y1 - 2011
N2 - A microcolumn is presented containing a variable axis lens optimized for large scan fields and pixel numbers with minimal probe sizes for the deflected beam. At beam energy of 1 keV and a working distance of 38 mm the magnifying column can address scan fields of more than 7 7mm2 employing dynamic correction. Simulations of the design predict a probe diameter of 75 nm on axis up to 1 lm for a beam being deflected 5 mm of axis, assuming a field emission source. Within a scan field of 3 3mm2 this microcolumn could address over 1 gigapixels of less than 100 nm in size. Tests of the column, using the 135 nm probe of a SEM as the source, resulted in a beam size of 720 nm on axis and up to 1.1 lm for a beam deflected 5 mm off axis, consistent with simulations.
AB - A microcolumn is presented containing a variable axis lens optimized for large scan fields and pixel numbers with minimal probe sizes for the deflected beam. At beam energy of 1 keV and a working distance of 38 mm the magnifying column can address scan fields of more than 7 7mm2 employing dynamic correction. Simulations of the design predict a probe diameter of 75 nm on axis up to 1 lm for a beam being deflected 5 mm of axis, assuming a field emission source. Within a scan field of 3 3mm2 this microcolumn could address over 1 gigapixels of less than 100 nm in size. Tests of the column, using the 135 nm probe of a SEM as the source, resulted in a beam size of 720 nm on axis and up to 1.1 lm for a beam deflected 5 mm off axis, consistent with simulations.
KW - academic journal papers
KW - CWTS JFIS < 0.75
UR - http://www.sciencedirect.com/science/article/pii/S0167931711000104
M3 - Article
SN - 0167-9317
VL - 88
SP - 2431
EP - 2434
JO - Microelectronic Engineering
JF - Microelectronic Engineering
ER -