Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

E. Serra, M. Bawaj, A. Borrielli, G. Di Giuseppe, S. Forte, N. Kralj, N. Malossi, L. Marconi, F. Marin, F. Marino, B. Morana, R. Natali, G. Pandraud, A. Pontin, G.A. Prodi, M. Rossi, P.M. Sarro, D. Vitali, M. Bonaldi

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)
17 Downloads (Pure)

Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.


Original languageEnglish
Article number065004
Pages (from-to)065004-1/065004-8
Number of pages8
JournalAIP Advances
Volume6
DOIs
Publication statusPublished - 2016

Fingerprint Dive into the research topics of 'Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications'. Together they form a unique fingerprint.

  • Cite this

    Serra, E., Bawaj, M., Borrielli, A., Di Giuseppe, G., Forte, S., Kralj, N., Malossi, N., Marconi, L., Marin, F., Marino, F., Morana, B., Natali, R., Pandraud, G., Pontin, A., Prodi, G. A., Rossi, M., Sarro, P. M., Vitali, D., & Bonaldi, M. (2016). Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications. AIP Advances, 6, 065004-1/065004-8. [065004]. https://doi.org/10.1063/1.4953805