Microstructural defects of device quality hot-wire CVD poly-silicon films.

JK Rath, FD Tichelaar, REI Schropp

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

5 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	"Amorphous and Microcrystalline Silicon Technology".
Editors	R Schropp, HM Branz, RW Colins, H Okamoto, S Guha
Pages	573-578
Number of pages	6
Publication status	Published - 1999

Name

Name	Materials Research Society Symposium Proceedings
Volume	557
ISSN (Print)	0272-9172

Cite this

@inproceedings{c73dd51791bd47d6b0ea265ef4d13417,

title = "Microstructural defects of device quality hot-wire CVD poly-silicon films.",

author = "JK Rath and FD Tichelaar and REI Schropp",

year = "1999",

language = "Undefined/Unknown",

pages = "573--578",

editor = "R Schropp and HM Branz and RW Colins and H Okamoto and S Guha",

booktitle = "{"}Amorphous and Microcrystalline Silicon Technology{"}.",

}

Microstructural defects of device quality hot-wire CVD poly-silicon films. / Rath, JK; Tichelaar, FD; Schropp, REI.
"Amorphous and Microcrystalline Silicon Technology".. ed. / R Schropp; HM Branz; RW Colins; H Okamoto; S Guha. 1999. p. 573-578 (Materials Research Society Symposium Proceedings; Vol. 557).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review