Abstract
Integration of an array of differently tuned mid-infrared metamaterial-based absorbers on top of thermopile detector arrays in a compatible fabrication process is presented. UV lithography is used for patterning over large areas with high throughput.
Original language | English |
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Title of host publication | Novel Optical Materials and Applications, NOMA 2018 |
Publisher | Optical Society of America (OSA) |
Pages | 1-2 |
Number of pages | 2 |
Volume | Part F107-NOMA 2018 |
ISBN (Electronic) | 978-1-943580-43-9 |
DOIs | |
Publication status | Published - 2018 |
Event | Novel Optical Materials and Applications, NOMA 2018 - Zurich, Switzerland Duration: 2 Jul 2018 → 5 Jul 2018 |
Conference
Conference | Novel Optical Materials and Applications, NOMA 2018 |
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Country/Territory | Switzerland |
City | Zurich |
Period | 2/07/18 → 5/07/18 |
Keywords
- Metamaterials
- Optical microelectromechanical devices