Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica

Liangyong Chu, A.V. Korobko, Anping Cao, Sumit Sachdeva, Zhen Liu, Louis C P M de Smet, E.J.R. Sudholter, Stephen J. Picken, Nicolaas A M Besseling

Research output: Contribution to journalArticleScientificpeer-review

33 Downloads (Pure)

Abstract

The Hamaker constant between graphene oxide and silica, which quantifies the strength of van der Waals forces is determined, by mimicking a “vacuum spacer” in an atomic force microscopyforce study. It is demonstrated that, a 2D spacer is expected to yield an accurately defined separation, owing to the high atom density and strength in planar direction compared with other dimensional spacers.
Original languageEnglish
Article number1600495
Pages (from-to)1-5
Number of pages5
JournalAdvanced Materials Interfaces
Volume4
Issue number5
DOIs
Publication statusPublished - 2017

Keywords

  • 2D materials
  • Atomic force microscopy
  • Graphene oxide
  • Hamaker constant
  • Vacuum spacers

Fingerprint Dive into the research topics of 'Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica'. Together they form a unique fingerprint.

  • Cite this