Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation

MA Blauw, EWJM van der Drift, G Marcos, A Rhallabi

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{391d280bb66744338166de1ba5dd6e1b,

title = "Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation",

keywords = "academic journal papers, ZX CWTS 1.00 <= JFIS < 3.00",

author = "MA Blauw and {van der Drift}, EWJM and G Marcos and A Rhallabi",

year = "2003",

language = "Undefined/Unknown",

volume = "94",

pages = "6311--6318",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "AIP Publishing",

number = "10",

}

TY - JOUR

T1 - Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation

AU - Blauw, MA

AU - van der Drift, EWJM

AU - Marcos, G

AU - Rhallabi, A

PY - 2003

Y1 - 2003

KW - academic journal papers

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 0021-8979

VL - 94

SP - 6311

EP - 6318

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

ER -