@article{391d280bb66744338166de1ba5dd6e1b,
title = "Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation",
keywords = "academic journal papers, ZX CWTS 1.00 <= JFIS < 3.00",
author = "MA Blauw and {van der Drift}, EWJM and G Marcos and A Rhallabi",
year = "2003",
language = "Undefined/Unknown",
volume = "94",
pages = "6311--6318",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "AIP Publishing",
number = "10",
}