Modulation device and charged particle multi-beamlet lithography system using the same

P. Kruit (Inventor), A.H. van Veen (Inventor)

Research output: Patent

Original language	English
IPC	H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B
Priority date	26/10/10
Publication status	Published - 2012

Patent: onknown
Applicant: MAPPER Lithography B.V.

Charged particle lithography system with aperture array cooling
Kruit, P. & van Veen, A. H., 2013, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Patent No. US 8558196 B2, Priority date 26 Oct 2010
Research output: Patent

Research output