Modulation device and charged particle multi-beamlet lithography system using the same

P. Kruit (Inventor), A.H. van Veen (Inventor)

ImPhys/Microscopy Instrumentation & Techniques

Research output: Patent

1 Patent

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2013

Charged particle lithography system with aperture array cooling
Kruit, P. & van Veen, A. H., 2013, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Patent No. US 8558196 B2, Priority date 26 Oct 2010
Research output: Patent