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Modulation device and charged particle multi-beamlet lithography system using the same
P. Kruit
(Inventor), A.H. van Veen (Inventor)
ImPhys/Microscopy Instrumentation & Techniques
Research output
:
Patent
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Research output
(1)
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2013
2013
2013
1
Patent
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2013
Charged particle lithography system with aperture array cooling
Kruit, P.
&
van Veen, A. H.
,
2013
, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Patent No. US 8558196 B2, Priority date
26 Oct 2010
Research output
:
Patent