Molecular dynamics simulation of silicon sputtering: sensitivity to the choice of potential

BJ Thijsse, TPC Klaver, EFC Haddeman

    Research output: Contribution to journalArticleScientificpeer-review

    21 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)29-38
    Number of pages10
    JournalApplied Surface Science
    Volume231-232
    Publication statusPublished - 2004

    Keywords

    • ZX CWTS JFIS < 1.00

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