Molecular dynamics simulation of silicon sputtering: sensitivity to the choice of potential

BJ Thijsse, TPC Klaver, EFC Haddeman

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{5b04a27a5e844259a3b1e8ea6731c4e3,

title = "Molecular dynamics simulation of silicon sputtering: sensitivity to the choice of potential",

keywords = "ZX CWTS JFIS < 1.00",

author = "BJ Thijsse and TPC Klaver and EFC Haddeman",

year = "2004",

language = "Undefined/Unknown",

volume = "231-232",

pages = "29--38",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

}