Molybdenum nanopillar arrays: Fabrication and engineering

Louis Maduro, Charles de Boer, Marc Zuiddam, Elvedin Memisevic, Sonia Conesa-Boj*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
21 Downloads (Pure)

Abstract

We report on the fabrication of molybdenum (Mo) nanopillar (NP) arrays with NP diameters down to 75 nm by means of deep-reactive ion etching at cryogenic temperatures. A variable-thickness Mo metal layer sputtered onto a Si3N4/Si substrate makes possible NPs with different lengths in a controllable manner. We demonstrate how our fabrication strategy leads to tunable cross-sections with different geometries, including hexagonal, cylindrical, square and triangular shapes, by using electron beam lithography on hydrogen silsesquioxane negative tone resist. To ensure well-defined facets and surfaces, we employ deep-reactive ion etching in a gas mixture of SF6 and O2 at cryogenic temperatures in an inductively coupled plasma reactive ion etching (ICP-RIE) system. These results represent an attractive route towards the realization of high-density Mo NP arrays for applications from nanoelectronics to quantum sensing and hydrogen evolution reaction catalysis.

Original languageEnglish
Article number114903
Number of pages7
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume134
DOIs
Publication statusPublished - 2021

Keywords

  • Cryogenic etching
  • Hydrogen silsesquioxane negative resist
  • Molybdenum
  • Nanopillars
  • Shape control

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