Multi-Scale modeling of chemical vapor deposition processes for thin film technology

CR Kleijn, R Dorsman, KJ Kuijlaars, M Okkerse, H van Santen

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{5f3d979166d94ff4ba0d724f707e4a0e,

title = "Multi-Scale modeling of chemical vapor deposition processes for thin film technology",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "CR Kleijn and R Dorsman and KJ Kuijlaars and M Okkerse and {van Santen}, H",

year = "2007",

language = "Undefined/Unknown",

volume = "303",

pages = "362--380",

journal = "Journal of Crystal Growth",

issn = "0022-0248",

publisher = "Elsevier",

number = "1",

}