| Original language | English |
|---|---|
| Patent number | WO 2008013442 A1 |
| IPC | Applicant: Mapper Lithography IP BV |
| Priority date | 31/01/08 |
| Publication status | Published - 2008 |
Bibliographical note
Applicant: Mapper Lithography IP BVKeywords
- Geen VSNU-classificatie
Multiple beam charged particle optical system
MJ van Bruggen (Inventor), P Kruit (Inventor)
Research output: Patent