Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

X Ma, Y Kato, Floris van Kempen, Y Hirai, T Tsuchiya, Fred van Keulen, O Tabata

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

9 Citations (Scopus)
19 Downloads (Pure)


We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.

Original languageEnglish
Title of host publicationProcedia Engineering - Eurosensors 2015
EditorsG. Urban, J. Wollenstein, J. Kieninger
Publication statusPublished - 2015
EventEUROSENSORS 2015, Freiburg, Germany - Amsterdam
Duration: 6 Sep 20159 Sep 2015

Publication series

NameProcedia Engineering
ISSN (Print)1877-7058


ConferenceEUROSENSORS 2015, Freiburg, Germany


  • Grayscale lithography
  • Simulation
  • Optimization
  • 3D microfabrication

Fingerprint Dive into the research topics of 'Multiple patterning with process optimization method for maskless DMD-based grayscale lithography'. Together they form a unique fingerprint.

Cite this