Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

X Ma; Y Kato; Floris van Kempen; Y Hirai; T Tsuchiya; Fred van Keulen; O Tabata

doi:10.1016/j.proeng.2015.08.778

Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

X Ma, Y Kato, Floris van Kempen, Y Hirai, T Tsuchiya, Fred van Keulen, O Tabata

Computational Design and Mechanics

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

15 Citations (Scopus)

48 Downloads (Pure)

Abstract

We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.

Original language	English
Title of host publication	Procedia Engineering - Eurosensors 2015
Editors	G. Urban, J. Wollenstein, J. Kieninger
Publisher	Elsevier
Pages	1091-1094
Volume	120
DOIs	https://doi.org/10.1016/j.proeng.2015.08.778
Publication status	Published - 2015
Event	EUROSENSORS 2015, Freiburg, Germany - Amsterdam Duration: 6 Sept 2015 → 9 Sept 2015

Publication series

Name	Procedia Engineering
Volume	120
ISSN (Print)	1877-7058

Conference

Conference	EUROSENSORS 2015, Freiburg, Germany
Period	6/09/15 → 9/09/15

Keywords

Grayscale lithography
Simulation
Optimization
3D microfabrication

Access to Document

10.1016/j.proeng.2015.08.778

1-s2.0-S1877705815024418-Final published version, 989 KBLicence: CC BY-NC-ND

Cite this

Ma, X., Kato, Y., van Kempen, F., Hirai, Y., Tsuchiya, T., van Keulen, F., & Tabata, O. (2015). Multiple patterning with process optimization method for maskless DMD-based grayscale lithography. In G. Urban, J. Wollenstein, & J. Kieninger (Eds.), Procedia Engineering - Eurosensors 2015 (Vol. 120, pp. 1091-1094). (Procedia Engineering; Vol. 120). Elsevier. https://doi.org/10.1016/j.proeng.2015.08.778

@inproceedings{78df418308474d97a32b0a6f2760296e,

title = "Multiple patterning with process optimization method for maskless DMD-based grayscale lithography",

abstract = "We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.",

keywords = "Grayscale lithography, Simulation, Optimization, 3D microfabrication",

author = "X Ma and Y Kato and {van Kempen}, Floris and Y Hirai and T Tsuchiya and {van Keulen}, Fred and O Tabata",

year = "2015",

doi = "10.1016/j.proeng.2015.08.778",

language = "English",

volume = "120",

series = "Procedia Engineering",

publisher = "Elsevier",

pages = "1091--1094",

editor = "G. Urban and J. Wollenstein and J. Kieninger",

booktitle = "Procedia Engineering - Eurosensors 2015",

note = "EUROSENSORS 2015, Freiburg, Germany ; Conference date: 06-09-2015 Through 09-09-2015",

}

Ma, X, Kato, Y, van Kempen, F, Hirai, Y, Tsuchiya, T, van Keulen, F & Tabata, O 2015, Multiple patterning with process optimization method for maskless DMD-based grayscale lithography. in G Urban, J Wollenstein & J Kieninger (eds), Procedia Engineering - Eurosensors 2015. vol. 120, Procedia Engineering, vol. 120, Elsevier, pp. 1091-1094, EUROSENSORS 2015, Freiburg, Germany, 6/09/15. https://doi.org/10.1016/j.proeng.2015.08.778

Multiple patterning with process optimization method for maskless DMD-based grayscale lithography. / Ma, X; Kato, Y; van Kempen, Floris et al.
Procedia Engineering - Eurosensors 2015. ed. / G. Urban; J. Wollenstein; J. Kieninger. Vol. 120 Elsevier, 2015. p. 1091-1094 (Procedia Engineering; Vol. 120).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

AU - Ma, X

AU - Kato, Y

AU - van Kempen, Floris

AU - Hirai, Y

AU - Tsuchiya, T

AU - van Keulen, Fred

AU - Tabata, O

PY - 2015

Y1 - 2015

N2 - We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.

AB - We report a multiple patterning approach utilizing digital-micromirror-device (DMD)-based grayscale lithography, providing a solution to improve fabrication accuracy for entire target three-dimensional structure. Because DMD-based lithography system consists a projection lens system, better resolution can be obtained around focal position comparing to the outer region of depth of focus. Thus, for thick-film resist micro structuring, exposing with multiple focal positions with separate grayscale masks leads to improvement of fabrication accuracy. In order to find the best combination of the multiple focal positions and their grayscale masks, the computational optimization is combined to the multiple patterning approach. Through a several experiments, effectiveness of the proposed approach was successfully demonstrated.

KW - Grayscale lithography

KW - Simulation

KW - Optimization

KW - 3D microfabrication

U2 - 10.1016/j.proeng.2015.08.778

DO - 10.1016/j.proeng.2015.08.778

M3 - Conference contribution

VL - 120

T3 - Procedia Engineering

SP - 1091

EP - 1094

BT - Procedia Engineering - Eurosensors 2015

A2 - Urban, G.

A2 - Wollenstein, J.

A2 - Kieninger, J.

PB - Elsevier

T2 - EUROSENSORS 2015, Freiburg, Germany

Y2 - 6 September 2015 through 9 September 2015

ER -

Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

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