Multiple patterning with process optimization method for maskless DMD-based grayscale lithography

X Ma, Y Kato, Floris van Kempen, Y Hirai, T Tsuchiya, Fred van Keulen, O Tabata

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

15 Citations (Scopus)
48 Downloads (Pure)

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Engineering

Material Science