Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results

Peter Van Der Walle; Pragati Kumar; Dmitry Ityaksov; Richard Versluis; Diederik J. Maas; Olaf Kievit; Jochem Janssen; Jacques C.J. Van Der Donck

doi:10.1117/12.2006408

Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results

Peter Van Der Walle, Pragati Kumar, Dmitry Ityaksov, Richard Versluis, Diederik J. Maas, Olaf Kievit, Jochem Janssen, Jacques C.J. Van Der Donck

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Abstract

TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.

Original language	English
Title of host publication	Photomask Technology 2012
Editors	Frank E. Abboud, Thomas B. Faure
Publisher	SPIE
ISBN (Electronic)	9780819492609
DOIs	https://doi.org/10.1117/12.2006408
Publication status	Published - 2012
Event	SPIE Conference on Photomask Technology 2012 - Monterey, United States Duration: 11 Sept 2012 → 13 Sept 2012

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8522
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	SPIE Conference on Photomask Technology 2012
Country/Territory	United States
City	Monterey
Period	11/09/12 → 13/09/12

Bibliographical note

Publisher Copyright:
© 2012 SPIE. All rights reserved.

Keywords

BRDF
Detection limit
EUV
Modeling
Particle inspection
Qualification
Rapid Nano
Speckle

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10.1117/12.2006408

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Van Der Walle, P., Kumar, P., Ityaksov, D., Versluis, R., Maas, D. J., Kievit, O., Janssen, J., & Van Der Donck, J. C. J. (2012). Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results. In F. E. Abboud, & T. B. Faure (Eds.), Photomask Technology 2012 Article 2006408 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8522). SPIE. https://doi.org/10.1117/12.2006408

@inproceedings{30b440722fb145bc9b3e2c47d6c2dc5e,

title = "Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results",

abstract = "TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.",

keywords = "BRDF, Detection limit, EUV, Modeling, Particle inspection, Qualification, Rapid Nano, Speckle",

author = "{Van Der Walle}, Peter and Pragati Kumar and Dmitry Ityaksov and Richard Versluis and Maas, {Diederik J.} and Olaf Kievit and Jochem Janssen and {Van Der Donck}, {Jacques C.J.}",

year = "2012",

doi = "10.1117/12.2006408",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Abboud, {Frank E.} and Faure, {Thomas B.}",

booktitle = "Photomask Technology 2012",

address = "United States",

}

Van Der Walle, P, Kumar, P, Ityaksov, D, Versluis, R , Maas, DJ, Kievit, O, Janssen, J & Van Der Donck, JCJ 2012, Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results. in FE Abboud & TB Faure (eds), Photomask Technology 2012., 2006408, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8522, SPIE, SPIE Conference on Photomask Technology 2012, Monterey, United States, 11/09/12. https://doi.org/10.1117/12.2006408

Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results. / Van Der Walle, Peter; Kumar, Pragati; Ityaksov, Dmitry et al.
Photomask Technology 2012. ed. / Frank E. Abboud; Thomas B. Faure. SPIE, 2012. 2006408 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8522).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

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AU - Van Der Walle, Peter

AU - Kumar, Pragati

AU - Ityaksov, Dmitry

AU - Versluis, Richard

AU - Maas, Diederik J.

AU - Kievit, Olaf

AU - Janssen, Jochem

AU - Van Der Donck, Jacques C.J.

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N2 - TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.

AB - TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.

KW - BRDF

KW - Detection limit

KW - EUV

KW - Modeling

KW - Particle inspection

KW - Qualification

KW - Rapid Nano

KW - Speckle

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M3 - Conference contribution

AN - SCOPUS:84923012869

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Photomask Technology 2012

A2 - Abboud, Frank E.

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PB - SPIE

Y2 - 11 September 2012 through 13 September 2012

ER -

Nanoparticle detection limits of TNO's Rapid Nano: Modeling and experimental results

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Keywords

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