TY - JOUR
T1 - Nanostructure and microstructure fabrication
T2 - From desired properties to suitable processes
AU - van Assenbergh, Peter
AU - Meinders, Erwin
AU - Geraedts, Jo
AU - Dodou, Dimitra
N1 - Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care
Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.
Correction to Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes
DOI: 10.1002/smll.201801989
Reference 190 was incorrectly cited in the initially published article. The correct reference is:[190] G. Vizsnyiczai, L. Kelemen, P. Ormos, Opt. Express2014, 22, 24217.
PY - 2018
Y1 - 2018
N2 - When designing a new nanostructure or microstructure, one can follow a processing-based manufacturing pathway, in which the structure properties are defined based on the processing capabilities of the fabrication method at hand. Alternatively, a performance-based pathway can be followed, where the envisioned performance is first defined, and then suitable fabrication methods are sought. To support the latter pathway, fabrication methods are here reviewed based on the geometric and material complexity, resolution, total size, geometric and material diversity, and throughput they can achieve, independently from processing capabilities. Ten groups of fabrication methods are identified and compared in terms of these seven moderators. The highest resolution is obtained with electron beam lithography, with feature sizes below 5 nm. The highest geometric complexity is attained with vat photopolymerization. For high throughput, parallel methods, such as photolithography (≈101 m2 h−1), are needed. This review offers a decision-making tool for identifying which method to use for fabricating a structure with predefined properties.
AB - When designing a new nanostructure or microstructure, one can follow a processing-based manufacturing pathway, in which the structure properties are defined based on the processing capabilities of the fabrication method at hand. Alternatively, a performance-based pathway can be followed, where the envisioned performance is first defined, and then suitable fabrication methods are sought. To support the latter pathway, fabrication methods are here reviewed based on the geometric and material complexity, resolution, total size, geometric and material diversity, and throughput they can achieve, independently from processing capabilities. Ten groups of fabrication methods are identified and compared in terms of these seven moderators. The highest resolution is obtained with electron beam lithography, with feature sizes below 5 nm. The highest geometric complexity is attained with vat photopolymerization. For high throughput, parallel methods, such as photolithography (≈101 m2 h−1), are needed. This review offers a decision-making tool for identifying which method to use for fabricating a structure with predefined properties.
KW - microfabrication
KW - microstructures
KW - nanofabrication
KW - nanostructures
UR - http://resolver.tudelft.nl/uuid:244581ba-268c-4456-80c9-f133f218841e
UR - http://www.scopus.com/inward/record.url?scp=85047909185&partnerID=8YFLogxK
U2 - 10.1002/smll.201703401
DO - 10.1002/smll.201703401
M3 - Review article
AN - SCOPUS:85047909185
VL - 14
JO - Small (online)
JF - Small (online)
SN - 1613-6829
IS - 20
M1 - 1703401
ER -