Near-ideal implanted shallow-junction diode formation by excimer laser annealing

V Gonda, A Bourtsev, TLM Scholtes, LK Nanver

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

11 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationProceedings of the 13th IEEE International Conference on Advanced Thermal Processing of Semiconductors
Editors s.n.
Place of PublicationPiscataway
PublisherIEEE Society
Pages93-100
Number of pages8
Publication statusPublished - 2005
Event13th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2005, Santa Barbara (CA), USA - Piscataway
Duration: 4 Oct 20057 Oct 2005

Publication series

Name
PublisherIEEE
Name
Volume13

Conference

Conference13th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2005, Santa Barbara (CA), USA
Period4/10/057/10/05

Bibliographical note

Editor & ISBN onbekend, WPM

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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