New photoresist coating method for 3-D structured wafers

VG Kiutchoukov, JR Mollinger, A Bossche

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	377-383
Number of pages	7
Journal	Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers
Volume	85
Issue number	1-3
Publication status	Published - 2000

Keywords

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title = "New photoresist coating method for 3-D structured wafers",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "VG Kiutchoukov and JR Mollinger and A Bossche",

year = "2000",

language = "Undefined/Unknown",

volume = "85",

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journal = "Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers",

issn = "0924-4247",

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TY - JOUR

T1 - New photoresist coating method for 3-D structured wafers

AU - Kiutchoukov, VG

AU - Mollinger, JR

AU - Bossche, A

PY - 2000

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KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 0924-4247

VL - 85

SP - 377

EP - 383

JO - Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers

JF - Sensors and Actuators A: Physical: an international journal devoted to research and development of physical and chemical transducers

IS - 1-3

ER -